Supercritical Fluid Deposition Of Thin Metal Films

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Hammond, J. S., N. Winograd, Journal of Electroanalytical Chemistry 1977, 78, 55-69. Hampden-Smith, M. J., T. T. Kodas, Chemical Vapor Deposition 1995, 1, 8-23. Hampden-Smith, M. J., T. T. Kodas, Chemical Vapor Deposition 1995, 1, 39-48. Hannay, J. B., J. Hogarth, Proceedings of the Royal Society of London 1879, 29, 324-326. Hernandez-Garduza, O., F. Garcia-Sanchez, E. Neau, M. Rogalski, Chemical Engineering Journal 2000, 79, 87-101. Holgado, J. P., G. Munuera, J. P. Espinos, A. R. Gonzalez-Elipe, Applied Surface Science 2000, 158, 164-171. Hones, P., F. Levy, T. Gerfin, M. Gratzel, Chemical Vapor Deposition 2000, 6, 193-198. Hoppe, H., N. Serdariciftci, Journal of Materials Research 2004, 19, 1924-1945. Howard, S. J., Y. C. Tsui, T. W. Clyne, Acta Metallurgica et Materialia 1994, 42, 2823-2836. Hsiao, P., K. Wang, C. Cheng, H. Teng, Journal of Photochemistry and Photobiology A- Chemistry 2007, 188, 19-24. Hughes, A. E., J. D. Gorman, P. J. K. Patterson, R. Carter, Surface and Interface Analysis 1996, 24, 634-640. Hughey, M. P., D. J. Morris, R. F. Cook, S. P. Bozeman, B. L. Kelly, S. L. N. Chakravarty, D. P. Harkens, L. C. Stearns, Engineering Fracture Mechanics 2004, 71, 245-261. Hunde, E. T., J. J. Watkins, Chemistry of Materials 2004, 16, 498-503. Hungria, T., M. Alguero, A. B. Hungria, A. Castro, Chemistry of Materials 2005, 17, 6205- 6212. Hwang, P., B. H. Li, T. Yang, Z. H. Zhai, F. W. Zhu, Acta Physica Sinica 2005, 54, 1841-1846. Hwang, P., B. H. Li, T. Yang, Z. H. Zhai, F. W. Zhu, Journal of University of Science and Technology Beijing 2004, 11, 319-323. International Technology Roadmap for Semiconductors, http://www.itrs.net/, 2007 Jasenek, A., U. Rau, K. Weinert, I. M. Kotschau, G. Hanna, G. Voorwinden, M. Powalla, H. W. Schock, J. H. Werner, Thin Solid Films 2001, 387, 228-230. Jeong, S., Y. N. Hsu, D. E. Laughlin, M. E. McHenry, Ieee Transactions on Magnetics 2001, 37, 1299-1301. 196

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