VAPOR PHASE TREATMENT OF DELECTRIC MATERALS

PDF Publication Title:

VAPOR PHASE TREATMENT OF DELECTRIC MATERALS ( vapor-phase-treatment-delectric-materals )

Previous Page View | Next Page View | Return to Search List

Text from PDF Page: 013

13 fromthesilicateororganosilicatedielectricfilmviasilyla tion;saidcontactingbeingconductedunderconditionssuffi cientto(i)or(i)or(i): (i)addcarboncontainingmoietiestothesilicateororgano silicatedielectricfilm,or (i)sealSurfaceporesofthesilicateororganosilicatedielec tricfilm,whenthefilmisporous;or (i)firstaddcarboncontainingmoietiestothesilicateor organosilicatedielectricfilm,andthensealSurfaceporesof thesilicateororganosilicatedielectricfilm,whenthefilmis porous. 10 14 ethylsilyl)acetamide, 2-(trimethylsilyl) acetic acid, n-(trimethylsilyl)imidazole, trimethylsilylpropiolate, trim ethylsilyl(trimethylsiloxy)-acetate, nonamethyltrisilaZane, hexamethyldisiloxane, trimethylsilanol, triethylsilanol, triphenylsilanol,t-butyldimethylsilanol,diphenylsilanediol, trimethoxysilane,triethoxysilane,trichlorosilane,andcom binationsthereof.Inonenoteworthyembodiment,thesurface modificationagentismethyltriacetoxysilane.Inapreferred embodimenttheSurfacemodificationagentisdimethyldiac etoxysilane. AdditionalSurfacemodificationagentsincludemultifunc tionalSurfacemodificationagentsasdescribedindetailin U.S.Pat.No.6,208,014,incorporatedbyreferenceherein,as described above. Such multifunctional surface modification agentscanbeappliedineithervaporform,gaseousform,or bychemicalvapordepositing,optionalywithorwithout co-solvents. Suitable co-solvents include, e.g., ketones, such as acetone,disopropylketone,2-heptanone,3-pentanone,and others,asdescribedindetailinco-ownedU.S.Pat.No.6,395, 651,thedisclosureofwhichisincorporatedbyreference herein. Forexample,asdescribedindetailinU.S.Pat.No.6,208, 014,certainpreferedsurfacemodificationagentswilhave twoormorefunctionalgroupsandreactwithSurfacesilanol functionalgroupswhileminimizingmasspresentoutsidethe structuralframeworkofthefilm,andinclude,e.g.,Surface silanolsmaycondensewithSuitablesilanolssuchas A Suitable Surface modification agent composition includesoneormoreSurfacemodificationagentsableto15 removesilanolgroupsfromtheSurfaceofanetchedand/or ashedorganosilicateglasdielectricfilmthatitisdesiredto renderhydrophobic.Thesemaybesilane,silaZane,silanols, orcarboxysilyl.Forexample,aSurfacemodificationagentis acompoundhavingaformulaselectedfromtheFormulas: (1)—SiRNR' inwheren-2andmaybecyclic;(2) RSiNR'SiR,(3)(RSi)N;(4)RSiNR';(5)RSi(NR): (6)RSi(NR),(7)R,SiCl,(8)R,Si(OH),(9)RSiOSiR's, (10)R,Si(OR),(1)R,Si(OCOR),(12)R,SiH,(13)R,Si25 OC(R')—R" andcombinationsthereof, US 7,678,712B2 whereinXisanintegerrangingfrom1to3,yisaninteger rangingfrom1to3Suchthaty=4-X;eachRisanindepen dentlyselectedfromhydrogenandahydrophobicorganic moiety.TheRgroupsarepreferablyindependentlyselected30 fromthegroupoforganicmoietiesconsistingofalkyl,aryl andcombinationsthereof.TheR'groupmaybeH,alkyl,aryl, whereinx=1-3,andeachRisindependentlyselectedmoi orcarbonylsuchasCOR,CONR,COR.TheR"maybealkyl orcarbonylsuchasCOR,CONR,COR ForalSurfacemodificationagents,thereactivesilylgroup35 mustcontainahydrolyzableleavinggroupSuchasbutnot limitedto—Cl,—Br.—I,—OR, NR (wherex=1-2), OCOR, OCOR, NRCOR, NRCOR, NR CONR,—SR, SOR.Forreactionofthesurfacemodifi cationagent,hydrolysismayoccurspontaneouslywithmois40 turepresentduringtheSurfacemodificationagentaplication andproces,orpre-hydrolysismaybeforcedduringthefor mulationproces. Thealkylmoietyiseitherfunctionalizedornon-function alizedandisderivedfromgroupsofStraightalkyl,branched45 alkyl,cyclicalkylandcombinationsthereof,andwhereinsaid alkylmoietyrangesinsizefromC toaboutCs.Thefunc tionalizationmaybeacarbonyl,ahalide,anamine,analco hol,anether,asulfonylorsulfide.Thearylmoietyissubsti tutedorunsubstitutedandrangesinsizefromCstoaboutCs.50 PreferablytheSurfacemodificationagentisanacetoxysilane, or,forexample,amonomercompoundSuchasacetoxysilane, acetoxytrimethylsilane, diacetoxysilane, triacetoxysilane, acetoxytrimethylsilane,diacetoxydimethylsilane,methyltri acetoxysilane,phenyltriacetoxysilane,diphenyldiacetoxysi55 lane,methyltriethoxysilane,dimethyldiethoxysilane,trim ethylethoxysilane, methyltrimethoxysilane, dimethyldimethoxysilane,trimethylmethoxysilane,methyl trichlorosilane, dimethyldichlorosilane, trimethylchlorsi lane,methylsilane,dimethylsilane,trimethylsilane,hexam60 ethyldisilaZane, hexamethylcyclotrisilaZane, bis (dimethylamino)dimethylsilane, bis(diethylamino) dimethylsilane, tris(dimethylamino)methylsilane, tris (dimethylamino)phenylsilane, tris(dimethylamino)silane, dimethylsilyldiformamide,dimethylsilyldiacetamide,dim65 ethylsilyldisocyante,trimethylsilylisocyanate,methylsilyl trisocyanate, 2-trimethylsiloxypent-2-ene-4-one, n-(trim eties.SuchasHand/oranorganicmoietySuchasanalkyl,aryl orderivativesofthese.WhenRisanalkyl,thealkylmoietyis optionalySubstitutedorunsubstituted,andmaybestraight, branchedorcyclic,andpreferablyrangesinsizefromCto aboutCs,orgreater,andmorepreferablyfromC toabout Cs.WhenRisaryl,thearylmoietypreferablyconsistsofa singlearomaticringthatisoptionalySubstitutedorunsub stituted,andrangesinsizefromCstoaboutCs,orgreater, andmorepreferablyfromCstoaboutCs.Inafurtheroption, thearylmoietyisaheteroaryl. Inanotherembodiment,alkoxysilanesmaybeusedasthe Surfacemodificationagent,e.g.SuitablealkoxysilanesSuch aS RSi(OR) whereinRareindependentlyselectedmoieties,suchasH and/oranorganicmoietysuchasanalkyl,arylorderivatives ofthese:Rareindependentlyselectedalkylorarylmoieties. When RorR'isanalkyl,thealkylmoietyisoptionaly Substitutedorunsubstituted,andmaybestraight,branchedor cyclic,andpreferablyrangesinsizefromC toaboutCs,or greater,andmorepreferablyfromC toaboutCs.WhenRor R"isaryl,thearylmoietypreferablyconsistsofasingle aromaticringthatisoptionalySubstitutedorunsubstituted, andrangesinsizefromCstoaboutCs,orgreater,andmore preferablyfromCstoaboutCs.Inafurtheroption,thearyl moiety is a heteroaryl. Thus, the R groups independently selectedfromH.methyl,ethyl,propyl,phenyl,and/orderiva tivesthereof,providedthatatleastoneRisorganic.Inone embodiment,bothRgroupsaremethyl,andatri-functional Surfacemodificationagentismethyltrimethoxysilane. Inanotherembodiment,asuitablesilaneaccordingtothe inventionhasthegeneralformulaof

PDF Image | VAPOR PHASE TREATMENT OF DELECTRIC MATERALS

PDF Search Title:

VAPOR PHASE TREATMENT OF DELECTRIC MATERALS

Original File Name Searched:

US7678712.pdf

DIY PDF Search: Google It | Yahoo | Bing

Sulfur Deposition on Carbon Nanofibers using Supercritical CO2 Sulfur Deposition on Carbon Nanofibers using Supercritical CO2. Gamma sulfur also known as mother of pearl sulfur and nacreous sulfur... More Info

CO2 Organic Rankine Cycle Experimenter Platform The supercritical CO2 phase change system is both a heat pump and organic rankine cycle which can be used for those purposes and as a supercritical extractor for advanced subcritical and supercritical extraction technology. Uses include producing nanoparticles, precious metal CO2 extraction, lithium battery recycling, and other applications... More Info

CONTACT TEL: 608-238-6001 Email: greg@infinityturbine.com (Standard Web Page)