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Chapter 5 Micro-structured Nafion membranes for DMFC applications membrane resistance due to a change in structure [22]. According to them, the heat treatment creates smaller ionic clusters, smaller pores and longer or tortuous transport channels. All these factors can cause increase in re- sistance. Liang et al. however, found an increase in concentration of sulfo- nic acid groups at the surface of a Nafion® 115 membrane after heat treat- ment [23]. According to them, the heat treatment (150-230 0C for 1,5 hours) sets free sulfonic groups that were previously buried in the backbone and side chains forming more compact clusters [21]. A high concentration of sulfonic acid groups near the surface decreases the contact resistance be- tween membrane and impedance measuring electrodes causing the conduc- tivity to approach that of the actual bulk conductivity [24]. Concerning our membranes, on first site one would expect increase of membrane resistance due to the densification of the structure and lower amount of water ad- sorbed by the membrane (see earlier section). Nonetheless, the densification itself may also increase the transport of H+ through the membrane due to decrease of tortuosity. The overall observed resistances (Fig. 6) may be re- sult of counterbalancing of these two mechanisms. 1.4 1.2 1.0 0.8 0.6 0.4 0.2 0.0 Membranes Figure 6. Resistances of line structured (μs), heat and pressure treated (hp) and normal N117 membranes. 3.5. Single cell performance Figure 7 shows maximum power density values of μs N117, hp N117 and normal N117 membranes as a function of time. MEAs were prepared using 80 N117 hpN117 μsN117 Resistance [Ohm]PDF Image | Development of membrane materials for direct methanol fuel cells
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