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Flame spray pattern modeled Figure 4.2.1 Study of the feasibility of thermal spraying an integral vane ring. 4.2.2 Bond coat composition and process development Numerical modeling was used to understand the mechanism that causes the reduction in substrate strength when a silicon bond coat is used on monolithic silicon nitride. When a thin layer of silicon is deposited on a silicon nitride substrate and the system is cooled from a stress-free temperature of 1000°C (1832°F), the in-plane tensile residual stress in silicon is given by the following equation: σ = E∆α∆T/(1-υ) (4.1) where E is the modulus of silicon, ∆α is the difference in coefficient of thermal expansion (CTE) of silicon and silicon nitride, ∆T is the temperature difference and υ is the Poisson’s ratio. Equation 4.1 predicts that the in-plane residual stress is of the order of 26 ksi (=179 MPa) which far exceeds the published values of tensile strength of silicon. The magnitude of tensile stress in silicon is fairly independent of thickness of silicon layer, and thickness and moduli of intermediate and top layers, as long as the thickness of coating layers is at least an order of magnitude lower than the substrate thickness (which is typically the case in most applications), as shown in Figure 4.2.2. A variety of coating architectures were considered with an objective to drive down the residual stress in the silicon layer. Some of the architectures are shown in Figure 4.2.3. The thermophysical properties of the layers were varied and it was found that if the CTE 84PDF Image | ADVANCED MICROTURBINE SYSTEMS Final Report for Tasks 1 Through 4 and Task 6
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