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(a) (b) Figure 4.2.7: (a) Fracture surface of as received silicon nitride that failed at 86.6 ksi in bend test. (b) Fracture surface of as silicon nitride coated with the compliant later and Si that failed at 81.4 ksi in bend test The fracture mirror radius is directly proportional to crack size from which the fracture initiated. The local stress at failure is hence inversely proportional to square root of fracture mirror radius. Since the failure strength determined from testing and the fracture mirror sizes are nearly the same for both samples shown in Figure 4.2.7, the local stresses at failure are also the same. This implies that the bond coat system on silicon nitride does not contribute to any additional local stresses and isolates the interaction of residual stress in the silicon layer from pre-existing flaws in silicon nitride. It is thus demonstrated that the bond coat system neither creates a different critical flaw population nor does it affect the stress intensity factor associated with the original flaw population present in the as received material. Collaborative work with Oak Ridge National Lab (ORNL) was initiated during the course of the contract for the purpose of developing optimum slurry conditions for dip coating of yttrium silicate layers for use in an EBC system. ORNL had demonstrated during 2004 the ability to produce uniformly thick, dense layers of BSAS and mullite on silicon carbide substrates using dip coating technology. Under this collaborative effort, ORNL used their expertise in colloid chemistry and the knowledge gained in 2004 to develop slurry compositions tailored specifically to UTRC’s coating chemistries and EBC architectures. The initial work focused on yttrium silicate slurry characteristics, since this is the prime candidate as the interlayer composition described in the earlier section. Working collaboratively with UTRC, ORNL did work to define the zeta potential and characterize the rheological behavior of the slurry as functions of slurry pH and percent solids loading. This basic information was then used to select the optimum slurry composition for initial dipping studies. Crack-free, uniformly thick layers of yttrium silicate were produced on substrates of SN282 silicon nitride using single and multiple dips to build up the desired coating thickness. CVD Si coatings were processed at UTRC using dichlorosilane as the precursor. Control of this process within a fairly narrow process window was found to be critically important to produce stable Si coatings and avoid chemical interactions with the other materials in the system. 89PDF Image | ADVANCED MICROTURBINE SYSTEMS Final Report for Tasks 1 Through 4 and Task 6
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