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US 2005/0145271 A1 Jul.7,2005 [0017] A?rstelectricalcableport21extendsthroughthe [0021] Aftertheorganicmaterialsaredissolvedandthe top chamber Wall 11 and provides for communication betWeen the exterior of the cleaning vessel 10 and the cleaning chamber 16. As discussed hereinbeloW, the ?rst electrical cable port 21 isjoined to a second electrical cable port 22 to form an electrical conduit 24. The electrical conduit 24 alloWs passage of an electrical cable 25 into the cleaning vessel 10. A ?uid inlet 28 also extends through the top chamber Wall 11. The ?uid inlet 28 is attached to piping (not shoWn), and isused to transport a Working medium into the cleaning chamber 16. [0018] Atransducerhousing30ispositionedintheclean ing chamber 16. The transducer housing 30 is ring-shaped, and includes a top housing Wall 31 and a bottom housing Wall 32. Extending betWeen the top housing Wall 31 and the bottom housing Wall 32 are an interior cylindrical Wall 33 andanexteriorcylindricalWall34.A cavity36isde?nedby thetophousingWall31,thebottomhousingWall32,andthe interior and exterior cylindrical Walls 33 and 34, and a cylindrical hole 38 through the transducer housing 30 is formed by the interior cylindrical Wall 33. [0019] The Working medium may be carbon dioxide (CO2) Which is ultimately transformed into supercritical CO2 inside the cleaning chamber 16. For example, gaseous CO2 enters the cleaning chamber 16 at pressures above atmosphere. The gaseous CO2 ?oWs through the ?uid inlet 28, and is directed around the transducer 30 and through the cylindrical hole 38. Because the viscosity of gaseous CO2 is signi?cantly less than the viscosity of liquid CO2, the gaseousCO2 iscapableof?llingthecleaningchamber16is a relatively short period of time. After ?lling the cleaning chamber16,thegaseousCO2istransformedintosupercriti cal CO2 by raising the pressure and temperature inside the cleaningchamber16abovethecriticalpressure(72.9atmo spheres) and critical temperature (313° C.) of CO2. During operation, theWorking ?uid isheld atpressure and tempera tures above its critical pressure and critical temperature, and thesupercriticalCO2 isdenseenoughtoconductmegasonic energy, as discussed hereinbeloW. Moreover, some organic materials are soluble in supercritical CO2. Consequently, the supercriticalCO2 iscapableofremovingsuchorganicmate rials from the surface of the semiconductor Wafer. [0020] A megasonic transducer 40 is provided in the cavity 36. The megasonic transducer 40 is ring-shaped, and produces megasonic energy in the form of high frequency vibrations ranging from 200 to 2,000 KilohertZ. During operation, these high frequency vibrations are directed doWnWardly through the transducer housing 30 to excite the Working medium above the pedestal 20. The high frequency vibrations are transmitted from the transducer housing 30 to the Working medium to create a series of pressure Waves in the Working medium. These pressure Waves are conducted by the supercritical CO2, and are directed doWnWardly toWard the pedestal 20 and the semiconductor Wafer carried by the pedestal 20. When applied to the surface of the semiconductor Wafer, these pressure Waves dislodge remain ing particulate materials. Therefore, because the Working medium during operation of the cleaning vessel 10 is supercritical CO2, some organic materials are dissolved by the supercritical CO2, and the remaining particulate mate rials are dislodged by the megasonic energy conducted by supercriticalCO2. remainingparticulatematerialsaredislodged,theWorking medium containing these contaminants ultimately can be evacuated through the ?uid inlet28. HoWever, before evacu ation, the pressure and temperature inside the cleaning chamber 16 are loWered beloW the critical pressure and critical temperature. Consequently, the supercritical CO2 is transformed into gaseous CO2, and the gaseous CO2 (con taining the above-discussed contaminants) may be emptied from the cleaning chamber 16 using the ?uid inlet 28. As discussed above, the viscosity of gaseous CO2 is signi? cantly less than the viscosity of liquid CO2, and therefore, the gaseous CO2 is capable of being emptied from the cleaning chamber 16 in a relatively short period of time. [0022] Themegasonictransducer40requiresanelectrical supplytooperate.Therefore,thesecondelectricalcableport 22 is provided through the top housing Wall 31 to alloW passage of the electrical cable 25 into the cavity 36. For example,acylindricalsealingsleeve42isprovidedbetWeen the top chamber Wall 11 and the top housing Wall 31. The cylindricalsealingsleeve42joinstogetherthe?rstelectrical cable port 21 and the second electrical cable port 22 to form the electrical conduit 24. Furthermore, the cylindrical seal ing sleeve 42 seals the electrical conduit 24 against the pressure provided in the cleaning chamber 16, thereby providing access to the megasonic transducer 40 at atmo spheric pressure through the electrical conduit 24. Conse quently, there is no need for high pressure electrical feedthroughs, and the electrical cable 25 can be connected to the megasonic transducer 40 at atmospheric pressure. [0023] It Will be understood that embodiments(s) described herein is/are merely exemplary, and that one skilledintheartmay make variationsandmodi?cations Without departing from the spirit and scope of the invention. All such variations and modi?cations are intended to be included Within the scope of the invention as described hereinabove. Itshould be understood that any embodiments described hereinabove are only in the alternative, but can be combined. 1.A megasoniccleaningvesselforcleaningasemicon ductorWafer,comprising: a top chamber Wall; a bottom chamber Wall; side Walls extending betWeen said top chamber Wall and said bottom chamber Wall to provide a cleaning cham ber; a megasonic transducer provided in said cleaning cham ber; a pedestal extending upWardly from said bottom chamber Wall for supporting the semiconductor Wafer; and anelectricalconduitprovidedthroughthecleaningvessel for connecting an electrical cable to said megasonic transducer at atmospheric pressure. 2. The megasonic cleaning vessel according to claim 1, further comprising a transducer housing provided in said cleaning chamber, and adapted to hold said megasonic transducer. 3. The megasonic cleaning vessel according to claim 2, Wherein the electrical conduit comprises a ?rst electricalPDF Image | MEGA SONIC CLEANING VESSEL USING SUPERCRITICAL CO2
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