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Nanomaterials2022,12,3x0F1O8RPEERREVIEW 44ooff7 Figure 2. XRD diffraction patterns of NNMO films at different oxygen pressures. Figure 3 shows the surface and cross-sectional FSEM diagram of the NNMO film under different oxygen partial pressures. When the partial pressure of oxygen is 35 Pa, the surface flatness of the film is poor, and a few crystalline particles appear. This may be because the lack of oxygen atoms hinders the growth of the film under low oxygen. As the partial pressure of oxygen rises to 50 Pa, more and more irregular crystalline particles appear, and the boundary between particles is not clear; when the partial pressure of ox- ygen continues to rise to 65 Pa, the grain size further increases, about 100 nm, showing a relatively uniform nanocrystalline particle. Figure 3d is an FSEM image of the deposited NNMO film cross-section on a SiO2/Si substrate. It can be seen that a layer of NNMO film composed of uniformly densely arranged grains is deposited on the surface of the SiO2/Si Fsiugbusrter2a.teX,RaDnditfhfreactthioicnkpnaetstesronsf tohf eNfNilMmOisfialmbosuat 5d5if0fenremn.t oxygen pressures. Figure 2. XRD diffraction patterns of NNMO films at different oxygen pressures. Figure 3 shows the surface and cross-sectional FSEM diagram of the NNMO film under different oxygen partial pressures. When the partial pressure of oxygen is 35 Pa, the surface flatness of the film is poor, and a few crystalline particles appear. This may be because the lack of oxygen atoms hinders the growth of the film under low oxygen. As the partial pressure of oxygen rises to 50 Pa, more and more irregular crystalline particles appear, and the boundary between particles is not clear; when the partial pressure of ox- ygen continues to rise to 65 Pa, the grain size further increases, about 100 nm, showing a relatively uniform nanocrystalline particle. Figure 3d is an FSEM image of the deposited NNMO film cross-section on a SiO2/Si substrate. It can be seen that a layer of NNMO film composed of uniformly densely arranged grains is deposited on the surface of the SiO2/Si substrate, and the thickness of the film is about 550 nm. Figure 3. Surface FSEM morphology of NNMO films deposited at different oxygen pressures (a) 35 Pa, (b) 50 Pa, (c) 65 Pa, (d) cross-sectional view of the films deposited on SiO2/Si substrates. Figure 4 shows the room temperature electrochemical properties of the NNMO film as a sodium-ion battery cathode material under constant current 13 mAg−1, voltage window 1.5–4.3 V test conditions. Figure 4a is a constant current cycle curve of the thin film deposited under different oxygen partial pressures. The first discharge-specific capacities of the 35 Pa, 50 Pa, and 65 Pa thin film electrodes were 163.9 mAh g−1, 171.1 mAh g−1, and 175.3 mAh g−1, respectively. It can be seen that, for the samples grown under 35 Pa and 50 Pa, the discharge-specific capacitance decreases rapidly when the number of cycles increases. After 30 cycles, the capacity retention rate was only 48% (78.2 mAh g−1) and 63% (108.0 mAh g−1) of the initial values, respectively. It may be that under the lowerPDF Image | xcimer Laser-Deposited Na Film Cathode Sodium-Ion Battery
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