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C uC 2C C C X g,i g,i D g,i g,i w,i Gt z A,G,i z2 2C AR g eq,Mass,G,i (2.18) In these equations, XG and XL are used to switch between the liquid and gas regions. During the displacement of gas, if the axial location for a node is downstream of the interface location, then XG for that node becomes one while XL becomes zero. The axial fluid property variation with this decoupled approach is discussed in Appendix B. During the desorption stage, gases desorbing out of the adsorbent crystals accumulate in the void spaces, and concentrations of both gases increase locally in the adsorbent layer. The increase in concentration and temperature causes an increase in the total pressure of the gases, which exceeds the pressure of the corresponding microchannel node at the start of desorption. Hence, favorable pressure and concentration gradients drive a convective-diffusive flow of desorbed gases radially inwards. Figure 2.5(a) explains the assumption of convective-diffusive flow during desorption. This quick desorption phenomenon is more likely to be short-lived and to exist during early desorption stage before the loss of desorbing gases to the microchannel, although this mechanism is explained in an exaggerated manner for illustrative purposes in Figure 2.5(a), where desorbing gases are shown as bubbles entering the microchannel from the adsorbent layer. The flow of gases from the adsorbent layer to the microchannel diminishes as a substantial mass of the gases leaves the adsorbent layer and mixes with the HTF stream. At this point, pressure equilibrium is attained between the microchannel and the adsorbent layer. Further desorption and outflow of gases takes place by slow diffusion through the gaseous void space and slow diffusion though the liquid boundary 30 C uC X g,i g,i D g,i g,i w,i 0 C C Lt z A,L,i z2 AR g eq,Mass,L,i PDF Image | TEMPERATURE SWING ADSORPTION PROCESSES FOR GAS SEPARATION
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