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Equation (2.4) with appropriate substitutions for liquid phase material properties. Depending on the desired extent of contaminant removal, the desorption stage may be extended beyond the time required for the initial desorption or thermal wave, which is described in the displacement modeling section. 2.2.4 Cooling stage model After the desorption process is complete, the adsorbent layer is brought to room temperature so that adsorbent particles can adsorb impurities again during the next feed gas cycle. Hence, cold HTF is passed through the microchannel. Species and energy equations used for the cooling model are identical to the equations used for the desorption stage. The only change in the equations involves an alteration of the boundary condition for the fluid temperature at the inlet. 2.2.5 Purge stage model The purge stage involves the displacement of the cold HTF in the microchannel. The channel is effectively dried and prepared for the next adsorption stage. The initial liquid displacement modeling methodology is discussed in the previous sections. Once the gas-liquid interface reaches the channel outlet as the purge gas displaces the cold HTF, the purge stage model is activated. Because this stage of the cycle involves purified CH4 flowing through the microchannel, the governing equations for heat and mass transfer and fluid flow are identical to Equations (2.3) through (2.9). As a result of the expected re-adsorption of the desorbing gases during the cooling stage, loss of pressure in the void spaces is expected to facilitate the entry of the HTF into the void space. Removal of the HTF trapped in the void spaces is only possible via evaporation as it cannot be physically displaced. If the outer surface of the adsorbent 34PDF Image | TEMPERATURE SWING ADSORPTION PROCESSES FOR GAS SEPARATION
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