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As the desorption process concludes, the hot water supply at the microchannel inlet is replaced by a cold water supply. However, the reduction in temperature causes silicalite to adsorb gases trapped at the end of desorption stage and increase the adsorbed CO2 concentration by a small margin. Figure 2.13(c) shows the temperature variation of the adsorbent layer during the cooling stage. It takes approximately 3 s for water to cool the entire adsorbent layer to 25°C from 200°C. Due to small thermal mass of the adsorbent layer and fused silica monolith wall, the cooling thermal wave breakthrough occurs nearly at the same instant as the cooling fluid breakthrough. Figure 2.14 shows the progress of water removal from the adsorbent layer as a result of evaporation. As water is removed, the gases in the purge stream diffuse and adsorb into the adsorbent, and the process is highly dependent on localized resistance offered by the remnant water in the void spaces. However, an overall estimate of the time when the adsorbent layer is free of liquid water can be acquired from Figure 2.14. This time estimate also covers the time required for drying the water films existing on the microchannel walls at the end of displacement of liquid, documented by Moore et al. (2016). After the liquid evaporation is complete, the adsorbed concentrations of species in the adsorbent layer are assumed to have reached the equilibrium concentration level, corresponding to the product tank mole fractions; and the process may be followed by sending a fresh batch of feed gases through the microchannels for purification, continuing the cycle. 61PDF Image | TEMPERATURE SWING ADSORPTION PROCESSES FOR GAS SEPARATION
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