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TEMPERATURE SWING ADSORPTION PROCESSES FOR GAS SEPARATION

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TEMPERATURE SWING ADSORPTION PROCESSES FOR GAS SEPARATION ( temperature-swing-adsorption-processes-for-gas-separation )

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partially absorbed by the fused silica cover (brown region in Figure 4.7(b)). This heat, in turn, is lost to the ambient by conduction through the insulation and by convection and radiation simultaneously. The heat transfer resistances required for the conservation equations are calculated as shown in Equations (4.20) through (4.25). Calculation of heat transfer resistances from the microchannel node to the adsorbent layer node and that from adsorbent layer node to the fused silica node is straightforward and adapted from the work by Pahinkar et al. (2015). Heat transfer from the fused silica cover to the ambient is calculated using Equation (4.22). lnRw,mid  1R RHeat,gw    h  h Peri 2k (4.20) (4.21) (4.22) Tw lnRhth lnRFS,mid  R  Rth RHeat,wFS   w,mid   h  2kw 2kFS R R   Heat,FS Heat,ins  RR 1 11  Heat ,conv Heat ,rad  Heat is assumed to flow through the insulation sheet followed by losses to the ambient by convection and radiation. The individual heat transfer resistances in Equation (4.22) are calculated using Equations (4.23) through (4.25). RHeat,conv  1 hfree Periins RHeat,rad  1 hrad Periins (4.23) (4.24) 123

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TEMPERATURE SWING ADSORPTION PROCESSES FOR GAS SEPARATION

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