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Now, I describe the important features of plasma processing of nanomaterials under extremely non equilibrium plasma conditions prevailing in Dense Plasma Focus (DPF) device. Material in the form of pellet or disc is needed for fixing it at the top of the anode. A pellet of material is made using powder, grinding and palletizing it. The pellet is then sintered at 700 oC in a furnace. A disc of material is made using the rod or foil of the material. This pellet or disc is fitted at the top of modified anode. 6.3.2 Phase change of magnetite from hematite using ions generated in DPF In the present work, the iron oxide ( -Fe2 O3) films have been irradiated by energetic argon ions. These films have been prepared by spin coating on glass substrate, using the gel obtained from iron (III) nitrate as precursor and 2-methoxy ethanol as solvent -Fe2 O3 films, having thicknesses of about 0.6 μm on a glass substrate, are irradiated at different heights from the top of the anode. Typical results for films irradiated at distances of Z = 8, 9, 10 and 11 cm are discussed in the present work. The XRD spectra of unexposed and ion irradiated films at heights of Z= 8, 9, 10 and 11 cm are shown in Fig. 17. The thickness of the unexposed film is of the order of 0.60 μm. The XRD spectrum of the film without irradiation (Fig. 17(a)) shows a sharp peak at 2 = 33.1 indicating the most prominent peak of non-magnetic, hexagonal -Fe2 O3 phase. The thickness of the film irradiated at Z = 8 cm from the top of the anode is less than 0.1 μm. At this height, most of the -Fe2O3 has been removed by the impact of argon ions. The XRD pattern of this film (Fig. 17(b)) shows an appreciable reduction in intensity corresponding to the peak of -Fe2 O3. The thickness of the film irradiated at Z= 9 cm is found to be about 0.13 μm. The XRD of this film is shown in Fig. 17(c). The peaks having hkl values (104) and (113) at 2 equal to 33.14o and 40.5 respectively correspond to -Fe2O3 and the doublet at about 2 = 43.5 and 43.2o shows the presence of both -Fe2 O3 and Fe3O4, phase. The thickness of the film irradiated at Z = 10 cm is found to be about 0.26 μm. The XRD of this film is shown in Fig. 17(d). The peaks are observed at 2 equal to 30.1 , 35.6 , 37.4 and 43.2 . These peaks correspond to hkl values (220), (31l), (222) and (400) respectively and suggest the presence of magnetic, cubic Fe2 O3 phase. The absence of all peaks of -Fe2O3 in the spectrum shown in Fig. 17(d) suggests a complete change of phase to Fe2O3. The finger print line from the (222) plane provides further confirmation of the Fe3O4 phase. The thickness of the film irradiated at Z = 11 cm is found to be about 0.54 μm. Fig. 17(e)f shows the XRD of this sample having peaks at 2 = 24.18 , 32.9 . 40.9 of -Fe2 O3 and at 2 = 43.0 of Fe3O4which indicates the presence of both -Fe2O3and Fe3O4, phase. 6.3.3 Thin films of materials deposited using DPF device a) CdS The amorphization of as-grown crystalline thin film of CdS fabricated using DPF device. The energetic ions produced in DPF have been used to irradiate the thin films of CdS which have been obtained by depositing CdS on a glass substrate by the vacuum evaporation technique. The as-grown crystalline CdS films mounted on a sample holder were inserted in a plasma chamber and placed at heights of Z = 10, 8,6, 4.2 and 2.5 cm from the top of the anode each time and were irradiated by means of energetic argon ions. The X-ray diffraction pattern of as-grown crystalline thin films of CdS is shown in Fig. 18. Changes in the surface morphology have been studied by utilizing a scanning electron microscope for the irradiated CdS film shown in Fig. 19. Fig. 18 XRD spectrum of as-grown crystalline Cds film after irradiation at Z=4.2 cm. Transactions of JWRI, Vol.39 (2010), No. 1 Fig. 17 X-ray diffraction pattern for (a) unexposed film and ion irradiated films at (b) Z = 8.0 cm. c) Z = 9.0 cm, (d) Z= 10.0 cm and (e) Z = 11.0 cm. 19PDF Image | Carbon Dioxide Decomposition by Plasma Methods
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