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Carbon Dioxide Decomposition by Plasma Methods and Application of High Energy and High Density Plasmas Fig. 19 SEM of as-grown crystalline film of CdS after irradiation at (a) Z=10 cm, (b) Z=8 cm, (c) Z=6 cm, (d) Z=4.2 cm, (e) Z=2.5 cm. Fig. 20 HRTEM of fullerene film. b) Fullerene The highly energetic and high fluence argon ions emitted in a dense plasma focus device are used to deposited fullerene films by ablating the graphite target such that the ablated material is deposited on a Si (111) substrate. These films have been studied using high resolution transmission electron microscope (HRTEM). To prepare the films silicon substrates are placed at a distance of 5.0 cm from the central anode and ten focused shots deposited on it. The HRTEM image is shown in Fig. 20. It shows the size of nanoparticles is of the order of 0.7 nm. c) Carbon Thin films of carbon are deposited on silicon, quartz and glass substrates keeping the target at different distances (like 1.3, 2.3 and 3.3 cm) above the anode and also varying the number of shots (n = 10, 20 and 30). The deposition of the films was carried out for two different orientations of the substrate with respect to the target. In the first orientation, the substrate was placed parallel to the axis of the anode and at a distance of 1 cm opposite to the center of the graphite target. In the second orientation the substrate was placed parallel to the target making an angle of 45” with the anode axis at a distance of 1 cm from the center of the graphite target. Visual inspection of the film shows a clearly distinct upper portion having a transparent, uniform brownish thin film on the substrate and a lower portion having a grayish hazy patch due to the deposition of macro particles. The thickness of the films was found to be in the range 1000 – 1500 Å. It was found that the roughness average of the films deposited with the second orientation of the substrate was less as compared to the first orientation. 6.3.4 Lead zirconate titanate (PZT) The PZT thin film has been deposited on the glass substrates using the ions generated in the DPF device. The PZT disc is formed in a solid state reaction and the materials initially taken are ZrO2, TiO2 and PbO. To form Pb (Zr0.53Ti0.47) O3, ZrO2, TiO2 and PbO are taken as 53 mol%, 47 mol% and 110 mol%, respectively. The additional 10 mol% of PbO has been taken to compensate for the Pb loss, which takes place while depositing films. The three powders are mixed, ground to a fine powder and pressed into a disc of 15 mm diameter and 5 mm thickness. It is preheated at 850 oC for 3 h. The disc is ground to a fine powder and again pressed into a disc this disc is sintered at 950 oC for 2 h. Glass substrates are placed at a distance of 4.2 cm from the central anode then ten focused shots deposited on glass substrate. The surface morphology has been studied by utilizing a High resolution transmission electron microscope (HRTEM) image shown in Fig. 21. The average size of nanoparticles is found to be of the order of 0.5 nm. Fig. 21 HRTEM of PZT. Fig. 22 XRD image of ZnO nanoparticles. 20PDF Image | Carbon Dioxide Decomposition by Plasma Methods
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