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as follows [61]: P = J⃗ · E⃗ where J⃗ is the current density given by Ohm’s law as: J⃗ = σE⃗. Here, σ is the DC electron conductivity found to be (3.22) (3.23) (3.24) σ = mν en where ne is the electron number density, m is the mass of an electron, and νen is the electron-neutral collision frequency. After substitution of (3.23) into (3.22), the final power transfer can be written as: 2 nee2E2 P=σE=mν . (3.25) en While Ohmic heating is the most common source of electron heating in a plasma, there are other heating mechanisms that are of importance depending on the discharge type. Low pressure RF capacitive and inductive discharges rely on stochastic heating, while wave-particle interactions play a role in helicon and MW sources. These mechanisms will be discussed in the following section along with properties of RF and MW sources. 3.1.3.1 Radio-frequency and Microwave Discharges RF discharges can be operated from low pressure up to atmospheric pressure, though the low-pressure regime will be the focus of this section because of its relevance to the experimental work performed for this dissertation. Low pressure RF plasmas are characteristically non-thermal with Te >> T0, due to a low electron-neutral collision ne e2 42PDF Image | CO2 Conversion in a Microwave Plasma Catalyst System
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