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frequency and high rates of gas cooling by the walls. RF plasmas can also be operated in three different power coupling regimes denoted as capacitive, inductive, and helicon mode. The characteristics of each mode will be described below. In a capacitively coupled plasma (CCP), an oscillating RF voltage is typically applied to electrodes located either within or outside the vacuum chamber. These two common configurations using parallel plates for the electrodes are shown in Figure 3.3. The CCP is particularly successful at stimulating high electric fields, facilitating plasma ignition [37]. Figure 3.3: Configurations for capacitive discharges: a) electrodes inside the plasma, and b) electrodes outside the plasma [37]. In this parallel plate configuration, an oscillating current flows between the plates forming a plasma in between, along with a corresponding voltage across the plates. A sheath of positive charges is formed along the surface of the electrode, where within the sheath ne << ni. This charge separation forms an internal potential, reflecting any electrons traveling towards the wall back into the plasma. Likewise, positive ions that enter the sheath are accelerated to the wall. The formation of the sheath and accompanying potential is shown in Figure 3.4. The current flowing within the sheaths is due to the time-varying electric field, unlike in the bulk plasma where the current is due to the conduction of electrons. Thus the sheath boundary will actually oscillate with the applied current [61]. This sheath boundary oscillation is the source of an electron heating mechanism called the stochastic heating effect. As an incoming electron with mean free path greater 43PDF Image | CO2 Conversion in a Microwave Plasma Catalyst System
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