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LIST OF TABLES 3.3 Orthorhombic unit cell parameters of refined diffraction patterns of all obtained SmNiO3 thin films and the silicon substrate. Mean pseudocubic parameters ap and lattice mismatch are given. All samples present tensile strain, larger for more ordered films de- positedinmixedargon-oxygenatmosphere.. . . . . . . . . . . . . 80 4.1 Comparison of thin film strain imposed by the substrate and crit- ical temperatures in temperature dependence of chosen Raman modeposition. ............................ 108 4.2 The details of fitting of nickel spectra of S-36AOw sample for vari- ous temperatures. The position of fitted peak maximum, area ratio between constituent lines and energy displacement for each tem- peraturearecalculated......................... 109 4.3 The details of fitting of nickel spectra of S-12AOw sample for vari- ous temperatures. The position of fitted peak maximum, area ratio between constituent lines and energy displacement for each tem- peraturearecalculated......................... 111 4.4 The details of fitting of nickel spectra of S-42Aw sample for vari- ous temperatures. The position of fitted peak maximum, area ratio between constituent lines and energy displacement for each tem- peraturearecalculated......................... 112 4.5 The details of fitting of nickel spectra of S-30AOn sample for vari- ous temperatures. The position of fitted peak maximum, area ratio between constituent lines and energy displacement for each tem- peraturearecalculated......................... 112 xviiiPDF Image | Investigation of metal-insulator transition in magnetron sputtered samarium nickelate thin films
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