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3. FILM CHARACTERIZATION Figure 3.4: Surface images of S-42An film - Microscopic images before (left) and after annealing (right) process. As-deposited sample is smooth and has minor defects, whereas defects in structure of the annealed film are much larger and inhomogeneous. 3.2 Chemical composition The applied measurement techniques allowed for comparison of chemical composi- tion of the films treated as a bulk with data obtained from microscopic techniques which gave more insight into the details of elemental distribution. X-ray Fluores- cence Spectroscopy was used as a bulk measurement technique, whereas X-ray Photoelectron Spectroscopy and Secondary Ion Mass Spectroscopy were used to investigate the chemical composition in more detail at the surface and as spatial distribution. 3.2.1 Bulk chemical composition The macroscopic investigation of the chemical composition of thin films was done by XRF. It allowed for mapping surfaces of the obtained samples with respect to the distribution of nickel and samarium as well as relative composition of the two elements. In figure 3.5 images of the distribution of main constituent metal element oxides in the sample S-12AOw is displayed. The distribution of samarium oxide and nickel oxide is quite homogeneous. The relative distribution of Sm2O3 and NiO seems homogeneous as well. The correlation of quantitative content of the two metals in the film indicates that the amount of samarium is slightly larger than nickel, however, the ratio is 66PDF Image | Investigation of metal-insulator transition in magnetron sputtered samarium nickelate thin films
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