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3.2 Chemical composition Figure 3.7: Macroscopic elemental distribution and thickness of S-30AOn thin film - Calculated from XRF and visualized by estimation and approximation by nearest neighbours. Distribution of nickel, samarium and chromium element is shown. Additionally Ni:Sm atomic ratio and sample thickness distribution as well. The sample as seen on XRF camera and analysis area defined in red rectangle in the first image. Chromium content is very low, below 0.4 at.% in comparison with the annealed samples. probably at the interface there is an oxidized layer of silicon of unknown crystal structure. The distribution of samarium and nickel, as well as other maps, are presented in figure 3.9. The distribution of the chemical elements appears to be rather homogeneous. Only thickness is not homogeneous in all films which is a common feature of films deposited by a sputtering method (especially at the film edges). As one could expect, the film thickness increases with sputtering time as evidenced in figure 3.10. The thickness for films deposited in argon atmosphere (A) is about twice as large as of the films deposited in a mixed atmosphere (AO). The dependence of film thickness on sputtering time is rather monotonic, however, it varies more for the samples deposited in argon. At small deposition times, the film is growing fast but quickly reaches the maximum point from which the growth speed decreases. This would suggest that the film exhibit an island growth at the beginning. The islands start to form, they attract new impinging species and grow fast. After some time most of the impinging atoms locate themselves in between the island forming layers, which is a slower process. This type of growth is called a mixed layer-island or Stranski-Krastanov type of growth (42). In Volmer-Weber type of growth, the interactions between the impinging atoms (adatoms) are stronger than the attraction of adatoms to the surface, therefore it 69PDF Image | Investigation of metal-insulator transition in magnetron sputtered samarium nickelate thin films
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