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3. FILM CHARACTERIZATION Figure 3.13: Spatial distribution of elements in sample S-12AOw. - A homogeneous distribution of samarium and nickel, with a slightly depleted surface area in favour of oxidized chromium presence. Chromium, silicon as well as other elements are found partially in the film’s volume. 3.3 Structural characterization Thermodynamic conditions during the deposition process as well as further post- treatment or the lack of it, have greatly influenced the structure of obtained SmNiO3 films. Films were deposited on silicon (100) substrates, which is the first obstacle to obtain the proper crystallographic phase. The structure of silicon crystal is an fcc cubic diamondlike structure while the nickel-samarium perovskite oxide crystallizes in orthorhombic/monoclinic structure. A comparison of their lattice parameters yields a certain lattice mismatch parameter which is larger for silicon than for example for perovskites like substrates such as LaAlO3 or SrTiO3. When the mismatch is high, there is not enough nucleation site for a 74PDF Image | Investigation of metal-insulator transition in magnetron sputtered samarium nickelate thin films
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