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Investigation of metal-insulator transition in magnetron sputtered samarium nickelate thin films

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Investigation of metal-insulator transition in magnetron sputtered samarium nickelate thin films ( investigation-metal-insulator-transition-magnetron-sputtered )

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3.3 Structural characterization Figure 3.14: Survey spectra of sample before (red) and after (blue) an- nealing of S-42Aw and S-42An deposited in pure argon atmosphere - Apart from clear presence of samarium, nickel and oxygen elements, the spectrum of annealed sample contains chromium (in red frame) and other contamination. proper structure to crystallize, this leads either to a strong structural distortion or formation of different crystallographic phases. SmNiO3 films were deposited under various atmospheres. For most of them, argon/oxygen atmosphere was used, because as expected and proven the mixed plasma yields more stoichiometric films. Pure argon plasma was used for deposi- tion very thin and thick films - 4 and 42 minutes deposition time. Out of curiosity, some of the newly deposited films were cut into two parts in order to investigate their crystalline structure before high-pressure oxidation. The 30-minute film de- posited in Ar+O2 plasma and 42-minute Ar deposited film were chosen. The rest of the samples were taken to the high-pressure chamber and annealed in high temperature and high oxygen pressure. In figure 3.16 the diffraction patterns of each of the prepared thin films are collected and compared according to the preparation conditions. A reference pat- tern of a measured pure SmNiO3 powder is given. It is easy to see that there are substantial differences between the patterns. Description of each of the pattern is given below. Films that were deposited with magnetron sputtering after depo- 75

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Investigation of metal-insulator transition in magnetron sputtered samarium nickelate thin films

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