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Investigation of metal-insulator transition in magnetron sputtered samarium nickelate thin films

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Investigation of metal-insulator transition in magnetron sputtered samarium nickelate thin films ( investigation-metal-insulator-transition-magnetron-sputtered )

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3.3 Structural characterization Figure 3.16: X-ray diffraction patterns of SmNiO3 - Comparison between diffraction patterns obtained in various conditions yields that only annealed films have the distorted SmNiO3 perovskite structure stabilized, while the as-deposited do not show almost any crystal structure. Deposition in pure argon atmosphere yields a polycrystalline film while films deposited in mixed Ar+O2 atmosphere show strong crystalline texture. thinnest film is very transparent and a strong contribution from silicon substrate at about 82 2θ is present. According to XRF measurements, the film is only as thin as 80 nanometers, which is possibly not that small as to uncover the substrate however during annealing the surface of the film was strongly damaged. For the thinnest film it is also evident that a broad ridge appears between 20-30 degrees 2θ, that could be an indicator of the presence of amorphous silicon dioxide. A very different crystallographic structure is observed for the films deposited in the atmosphere of a mixture of argon and oxygen plasma gas, after annealing. Most of the films, apart from the thinnest one, shows a very strong crystallo- graphic texture. The intensity is enhanced for the peaks identified as (110)(002) 77

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Investigation of metal-insulator transition in magnetron sputtered samarium nickelate thin films

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