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3. FILM CHARACTERIZATION Figure 3.17: X-ray diffraction patterns of SmNiO3 thin films deposited in argon plasma and annealed. - Both samples present a polycrystalline SmNiO3 structure. The Bragg peaks are wide most probably due to, apart from strain, nanometric size of crystallites they are build of. and (220)(004) when compared to the polycrystalline pattern displayed for exam- ple by the SmNiO3 powder. Large peak broadening does not allow to resolve peaks (110) from (002). The thinnest film shows also some other peaks that have not been ascribed to any crystalline phase. This film seems to have a high amorphous phase contribution, given the broad hump between 35-65 degrees 2θ. The crystallographic texture was investigated with X-ray diffraction pole fig- ure method. Pole figures of (110)(002) planes were recorded at 27.24 ◦2θ. The obtained figure is a combination of signal obtained from the film and from the monocrystalline silicon substrate. In the description of pole figure measurements, it is important to note that the X-ray radiation used for the experiments was only filtered. Therefore most of the Kβ radiation was filtered out, but a signifi- cant component of Kα2 contributes to some smearing of the obtained intensity. It is also important to note that the focusing plane during X-ray diffraction ex- 78PDF Image | Investigation of metal-insulator transition in magnetron sputtered samarium nickelate thin films
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