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3.3 Structural characterization Figure 3.18: X-ray diffraction patterns of SmNiO3 thin films deposited in argon-oxygen plasma and annealed. - A strong crystalline texture is evi- dent for most of the samples. The thinnest one shows additional contribution of amorphous phase and other unidentified crystalline phases. The thickest one due to some damage does not present a strong intense Bragg peaks. periment is at the specimen surface, which is the top layer of the deposited film. The surface of the silicon substrate is tens or hundreds of nanometers below the focusing plane. This should result in an unavoidable shift/displacement of the signal obtained from the silicon substrate. When the pole figure is collected for (220)(004) planes, i.e. at 56.28◦2θ the pole figure looks quite different (figure 3.21). The signal from the four distinct spots at about 45◦2θ is very large and reaches about 23k counts. This alone sug- gests that the signal comes from a highly crystalline phase with cubic crystal symmetry. It is fair to assume that the signal comes from the monocrystalline silicon substrate and can be identified as 111 set of crystal plane normals in re- ciprocal space. According to the (The Rigaku Journal, 27(2), 2011, the technical article entitled ”X-ray thin film measurement techniques VII. Pole Figure Mea- 79PDF Image | Investigation of metal-insulator transition in magnetron sputtered samarium nickelate thin films
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