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3.3 Structural characterization Figure 3.22: Rietveld refinement of S-36AOw diffraction pattern. - Strong texture of the actual SmNiO3 phase led to amplify the intensity for only several Bragg peaks, The main (020)(112)(200) peak of the orthorhombic structure does not appear in the pattern. The macroscopic investigation of SmNiO3 film surface done by optical mi- croscopy has revealed that the surface has a rich characteristic. Different kinds of species are a result of high-pressure annealing. This was described at the be- ginning of the chapter while describing the deposition process. The morphology of the films in micro and nanoscale was measured with atomic force microscopy. This technique was used to investigate both the topography and the electric be- haviour of the film (using LC-AFM mode) during a temperature change in the measurement chamber. Therefore, in general, a conducting Pt coated silicon tip for contact mode was used. In some experiments, a non-contact tapping mode was applied which enabled to obtain a higher resolution of topographic images. Before annealing, the films are quite smooth with small grains, as seen for S-30AOn sample in figure 3.23. The surface roughness is about a few nanometers. One can also notice large grains as well as ridges. The large objects observed under 83PDF Image | Investigation of metal-insulator transition in magnetron sputtered samarium nickelate thin films
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