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4. INVESTIGATION OF METAL-INSULATOR TRANSITION Table 4.4: The details of fitting of nickel spectra of S-42Aw sample for various temperatures. The position of fitted peak maximum, area ratio between constituent lines and energy displacement for each temperature are calculated. T,K 1 2 3 7 8 9 1/2 303 855.04 856.46 857.58 872.26 874.42 876.78 1.50 103 854.4 856.09 858.27 871.93 873.88 876.46 1.30 303 853.85 855.03 857.1 871.98 873.93 876.4 0.21 493 855.02 856.2 857.48 872.09 874.06 876.17 1.74 7/8 2-1 8-7 0.83 1.42 2.16 1.4 1.69 1.95 1.67 1.18 1.95 2.65 1.18 1.97 Table 4.5: The details of fitting of nickel spectra of S-30AOn sample for various temperatures. The position of fitted peak maximum, area ratio between constituent lines and energy displacement for each temperature are calculated. T,K 1 2 3 7 8 9 1/2 103 855.78 857.20 858.95 873.11 874.48 875.80 0.62 303 854.56 855.77 858.24 872.01 873.48 875.31 0.35 493 854.34 855.54 857.71 871.88 873.24 876.45 0.35 7/8 2-1 8-7 0.79 1.42 1.37 0.82 1.21 1.47 0.36 1.2 1.36 the peak displacement and area ratio are much larger than for sample S-36AOw at lower temperature. At high temperatures, at 683 K for S-36AOw and at 673 K for S-12AOw, the area ratio of peaks 1:2 forming the Ni 2p3/2 line are quite similar - 0.18 and 0.23 respectively for both samples. The energy displacement between peaks 1 and 2 at temperature below RT is about 1.34 eV for S-36AOw and 3.09 eV for S-12AOw. While temperature increases, the separation diminishes for both samples and well above MI transition temperature it is about 1.3 eV for S-36AOw and 1.45 eV for S-12AOw. It is not unusual to see that also annealed film deposited in pure argon does exhibit temperature variation of nickel spectra (figure 4.19). The same analysis was performed for film deposited without annealing. Some additional low energy peaks at low temperature were necessary to be added which were not taken into account when discussing the spectra variation with temper- ature. 112PDF Image | Investigation of metal-insulator transition in magnetron sputtered samarium nickelate thin films
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