TEMPERATURE SWING ADSORPTION PROCESSES FOR GAS SEPARATION

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TEMPERATURE SWING ADSORPTION PROCESSES FOR GAS SEPARATION ( temperature-swing-adsorption-processes-for-gas-separation )

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layer (i.e., the channel wall) were to permit mass transfer, application of a pressure difference across the inner and outer surface of the annular layer with a purge gas would have helped in removal of the liquid. Hence, for estimation of the time required for the HTF to evaporate, an independent kinetic model is developed in gPROMSTM. It is assumed that HTF occupies the entire void space at the end of the cooling stage and the total mass of trapped HTF can be calculated using Equation (2.19). The concept of HTF evaporation in the adsorbent layer void space and vapor-liquid interface movement in the void spaces are illustrated schematically in Figure 2.6(a) and Figure 2.6(b), respectively. ML,ini VwL (2.19) Figure 2.6. (a) Schematic representation of water evaporation as it is exposed to concentration gradient (b) Illustration of an instant in time during water removal It is assumed that liquid and vapor phases of the HTF are in equilibrium at the interface. The mass fraction of HTF in gas at the vapor-liquid interface can be determined by ratio of the saturation pressure of HTF at the liquid temperature and the total gas pressure in the void space. The evaporated HTF at the interface is exposed to the concentration gradient as purge gas is assumed to contain negligible HTF vapor. Thus, 35

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