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the rate of removal of evaporated HTF can be determined from Equation (2.20), which is a function of HTF diffusivity and tortuosity of the adsorbent layer. dML D A dy (2.20) dt eff,HTFCH4 s G thl With an initial condition of an HTF filled adsorbent layer, the kinetic model is simulated until the total mass of the HTF becomes zero. This kinetic model is also validated analytically as shown in Equation (2.21), where first order differential equation for mass conservation is solved by simple integration. For the displacement of liquid, the clean displacement approach used for the displacement of gas is not valid, as Moore (2012) observed intermittent, annular and rivulet flow regimes, and in absence of liquid replenishment, these regimes are soon replaced by single-phase gas flow. Because the purge stage continues even after the theoretical time required for the displacement of liquid, this additional purge stage time is utilized to remove the HTF from both domains, the microchannel and the adsorbent layer. It is expected that at the end of the purge stage, not only the adsorbent layer, but also the microchannel flow region, is free of HTF. Furthermore, surface tension does not play an appreciable role during the purge stage, because drying of static liquid due to evaporation is merely dependent on how fast the evaporated liquid can be removed from the adsorbent layer via diffusion. t purge th2 2D L (2.21) 36 eff ,HTF CH4 GPDF Image | TEMPERATURE SWING ADSORPTION PROCESSES FOR GAS SEPARATION
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