TEMPERATURE SWING ADSORPTION PROCESSES FOR GAS SEPARATION

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TEMPERATURE SWING ADSORPTION PROCESSES FOR GAS SEPARATION ( temperature-swing-adsorption-processes-for-gas-separation )

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Table D.1. Calculation of heat and mass transfer resistances – continued h m,He h m,N2 h m,CO2  0.178 [m s-1]  0.136 [m s-1]  0.114 [m s-1] Peri1.477103 [m] Rw,mid  250106 [m] Rh 235106 [m] DHe,mix,eff ,total DN2 ,mix,eff ,total DCO2 ,mix,eff ,total 1.62105 [m2 s-1] 1.28105 [m2 s-1]  1.11105 [m2 s-1 ] Mass transfer resistance between microchannel and adsorbent layer lnRw,mid  1R RMass,i    h  hm,i  Peri 2 Di,eff ,total R 4411[sm-2] Mass , He R R Mass,N2 Mass ,CO2  5748 [s m-2 ]  6834 [s m-2 ] h 751[Wm-2 K-1] T Peri1.477103 [m] Rw,mid  250106 [m] Rh 235106 [m] k 0.376[Wm-1 K-1] w Heat transfer resistance between microchannel and adsorbent layer lnRw,mid  1R RHeat,gw    h  h Peri 2k Tw R Heat,gw 0.928[W-1 mK] th30106 [m] Rw,mid  250106 [m] Rh 235106 [m] RFS,mid  295106 [m] k 0.376[Wm-1 K-1] w k FS 1.3 [W m-1 K-1] Heat transfer resistance between adsorbent layer and fused silica cover lnRhth lnRFS,mid  R  Rth RHeat,wFS   w,mid   h  2kw 2kFS R Heat,wFS 0.049[W-1 mK] Table D.1. Calculation of heat and mass transfer resistances – continued 201

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