TEMPERATURE SWING ADSORPTION PROCESSES FOR GAS SEPARATION

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TEMPERATURE SWING ADSORPTION PROCESSES FOR GAS SEPARATION ( temperature-swing-adsorption-processes-for-gas-separation )

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RFS,mid  295106 [m] RIns,inner 325106 [m] k 1.3[Wm-1 K-1] FS k 0.02529[Wm-1 K-1] air Dins 0.0265[m] RaD 1948 Pr  0.728 PeriIns 0.08325[m]  r = 0.1   5.6710-8 [Wm-2 K-4] Heat transfer resistance between fused silica cover and ambient RHeat,ins  k h  air  R  Ins,inner  ln RFS,mid  2kFS  2  1 6 0.387Ra   0.60 D  free 8 Dins   927  16   10.559   Pr   h 4T3 rad r 0 RHeat,conv  1 hfree Periins 1 cover to ambient Heat,FS Heat,ins RHeat,rad  Total heat transfer resistance from fused silica hrad Periins R R111  RR  Heat ,conv Heat ,rad  1.475[W-1 mK] h 0.5832[Wm-2 K-1] R h 2.841[Wm-2 K-1] Heat ,ins free rad R R R 4.22[W-1 mK] 20.6[W-1 mK] 4.984[W-1 mK] Heat ,conv Heat,rad Heat,FS 202

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